Tuning of Atomic Layer Deposition Pulse Time through Physics-Informed Bayesian Active Learning

TL;DR

This paper presents a physics-informed Bayesian active learning framework that efficiently tunes ALD process parameters, reducing experimental effort and improving accuracy by integrating a Langmuir model into Gaussian Processes.

Contribution

The authors introduce a novel two-stage parameter estimation method that decouples noise filtering from physical parameter extraction in ALD tuning.

Findings

Converges within five iterations in simulated regimes.

Up to fourfold improvement in prediction accuracy.

Reduces precursor usage by two to four times.

Abstract

Atomic Layer Deposition (ALD) process development is often hindered by time-consuming and precursor-intensive tuning cycles required to identify saturation conditions. We introduce a physics-informed Bayesian active learning (BAL) framework that autonomously tunes precursor pulse times by integrating a Langmuir adsorption model directly into the Gaussian Process (GP) kernel. A key innovation is a two-stage parameter estimation strategy that decouples noise filtering from physical parameter extraction: the GP first smooths noisy data through standard prediction, then Langmuir parameters are fitted to the noise-filtered GP predictions. This approach effectively separates signal from experimental noise. We evaluate the framework against a standard data-driven GP across four simulated regimes, demonstrating convergence within five iterations, up to fourfold improvement in prediction accuracy, and two to fourfold reduction in precursor usage. Experimental validation using TiO2 deposition via Tetrakisdimethylamido Titanium (TDMAT) and ozone confirms that the physics-informed model accurately identifies saturation times for high-coverage targets ($\geq$95\%), with observed deviations at lower saturation levels providing valuable insight into non-ideal desorption behaviors.