Wide-Surface Furnace for In Situ X-Ray Diffraction of Combinatorial Samples using a High-Throughput Approach
Giulio Cordaro (SPMS, IRCP), Juande Sirvent (IREC), Cristian Mocuta (SSOLEIL), Fjorelo Buzi (IREC), Thierry Martin (SPMS), Federico Baiutti (IREC, KI), Alex Morata (IREC), Albert Taranc\`on (ICREA), Dominique Thiaudi\`ere (SSOLEIL), Guilhem Dezanneau (SPMS)

TL;DR
This paper introduces a high-temperature furnace with a controlled atmosphere for in situ X-ray diffraction of large combinatorial samples, enabling rapid characterization of material libraries at elevated temperatures.
Contribution
It presents a novel furnace design that allows high-throughput, in situ structural analysis of 100 mm wafers at high temperatures in controlled atmospheres.
Findings
Successful in situ XRD and XRF measurements at up to 735°C
Calculated thermal expansion coefficients for the ternary system
Identified limitations of Vegard's law for high-entropy materials
Abstract
The combinatorial approach applied to functional oxides has enabled the production of material libraries that formally contain infinite compositions. A complete ternary diagram can be obtained by pulsed laser deposition (PLD) on 100 mm silicon wafers. However, interest in such materials libraries is only meaningful if high-throughput characterization enables the information extraction from the as-deposited library in a reasonable time. While much commercial equipment allows for XY-resolved characterization at room temperature, very few sample holders have been made available to investigate structural, chemical, and functional properties at high temperatures in controlled atmospheres. In the present work, we present a furnace that enables the study of 100 mm wafers as a function of temperature. This furnace has a dome to control the atmosphere, typically varying from nitrogen gas to pure…
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Taxonomy
TopicsMachine Learning in Materials Science · Catalysis and Oxidation Reactions · X-ray Diffraction in Crystallography
