Dielectric Screening in Electromagnetic Dressing of Semiconductors
Quentin Courtade, Umberto Dellasette, Sotirios Fragkos, St\'ephane Petit, Dominique Descamps, Yann Mairesse, and Samuel Beaulieu

TL;DR
This study investigates how the dielectric properties of semiconductors influence electromagnetic dressing effects, particularly Floquet-Volkov states, using photoemission spectroscopy on layered van der Waals materials.
Contribution
It introduces a combined model to extract dielectric functions from Volkov sidebands and explores nonlinear and multiple reflection effects in light-matter interactions.
Findings
Dielectric properties set bounds for Floquet-Volkov dressing.
High laser fluence generates high-order Volkov sidebands.
Multiple internal reflections produce delayed Volkov replicas.
Abstract
Nonequilibrium manipulation of quantum materials via electromagnetic dressing provides an on-demand route to tailoring electronic band structures through Floquet engineering. Time- and angle-resolved photoemission spectroscopy offers a direct means to probe these light-dressed electronic states. In such photoemission experiments, dressing can also occur for quasi-free electrons outside the material, giving rise to Volkov states. In certain cases, strong surface screening reduces the penetration of the driving field into the solid, resulting in Volkov contributions that dominate over Floquet ones. In this work, we systematically investigate the influence of materials' dielectric properties on Floquet-Volkov dressing of semiconductors, focusing on bulk layered van der Waals materials GeS, SnS, and 2H-WSe. First, by combining a simple model based on Fresnel equations with an…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
