On the modeling and mitigation of interference fringes in polarimetric instrumentation

TL;DR

This paper analyzes the origins of spectral and spatial fringes in polarimetric instruments, proposing an approximate model to predict and mitigate these artifacts, especially in isotropic and uniaxial materials.

Contribution

It introduces a simplified yet effective approach to model interference fringes in birefringent materials, aiding optical design for high-sensitivity polarimetry.

Findings

The small-birefringence approximation is effective for common optical materials.

Modeling examples illustrate fringe dependence on design parameters.

Comparison with Berreman calculus validates the approximation's limits.

Abstract

Spectral and spatial fringes in polarized light are produced by the interference of transmitted and reflected waves at the interface between materials with different indexes of refraction. These instrumental artifacts can affect the accuracy of optical designs conceived for high-sensitivity spectroscopy and polarimetry. We consider the principal sources of these artifacts and the possible design pathways to mitigate them. In order to do so, we have developed an approximate yet agile treatment of the problem of the transmission and reflection of light in birefringent materials, which fundamentally relies on the assumption of small birefringence of the modeled materials for its implementation. The comparison of our results with those from more rigorous treatments, such as Berreman calculus, thus also serves as a test of the limits of the small-birefringence approximation in optical design applications. The treatment presented in this work is limited to isotropic materials and uniaxial crystals, which are the most common types of optics employed in polarimetric instrumentation. An extensive set of modeling examples is provided to illustrate the salient characteristics of polarization fringes and their dependence on optical design parameters.