Preprint: Sheath thickness measurements with the biased plasma impedance probe, Agreement with Child Langmuir scaling
John Whitlock Brooks, Richeek Dutta

TL;DR
This paper demonstrates that the plasma impedance probe (PIP), when biased, can directly measure plasma sheath thickness and validate Child-Langmuir scaling, offering a less invasive diagnostic method that aligns well with traditional models.
Contribution
The study introduces a biased-PIP technique for sheath thickness measurement, validating its agreement with Child-Langmuir scaling and extending it to estimate plasma parameters without biasing.
Findings
Biased-PIP sheath measurements follow Child-Langmuir scaling with a correction factor of ~0.74.
Probe biasing does not significantly affect bulk plasma density.
Floating-PIP estimates of plasma parameters agree with biased Langmuir probe results.
Abstract
Plasma sheaths play a central role in plasma-surface interactions, yet their thickness remains challenging to measure experimentally. Although classical analytical models such as the Child-Langmuir (CL) sheath model provide clear predictions for sheath thickness, experimental validation has been limited because most diagnostics either rely on indirect, multi-step inference (e.g., Langmuir probes) or require invasive and technically demanding techniques. In this work, we demonstrate that the plasma impedance probe (PIP), when operated with a controlled DC bias, enables relatively direct, model-informed measurements of sheath thickness that are reasonably straightforward to implement experimentally. Across a range of discharge conditions, biased-PIP sheath thickness measurements are found to follow CL scaling closely, requiring a single, consistent empirical correction factor of $\alpha…
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Taxonomy
TopicsPlasma Diagnostics and Applications · Magnetic confinement fusion research · Ionosphere and magnetosphere dynamics
