Design and fabrication of guiding patterns for topography-based searching of 2D devices for scanning tunneling microscopy measurements

TL;DR

This paper introduces a new guiding pattern design for efficient topography-based navigation of 2D devices in STM, enabling precise localization without additional hardware modifications.

Contribution

It presents a novel fabrication of guiding patterns on SiO2/Si wafers for reliable, hardware-free device localization in STM using topographic imaging.

Findings

Successful localization of 2D devices in STM using guiding patterns

Achieved atomically resolved imaging and spectroscopy

Compatible with standard fabrication processes

Abstract

We report the design and fabrication of guiding patterns for topography-based searching of two-dimensional (2D) devices for scanning tunneling microscopy (STM) measurements. Sub-micron geometric coordinate markers were etched into SiO2/Si wafers, serving as both substrates for 2D device integration and guiding maps for sample navigation. Here, we used a monolayer graphene/h-BN device with an active area of smaller than 20 um x 20 um as a model system and demonstrated that the device could be reliably located in STM solely through topographic imaging of the guiding patterns and in situ stage calibration, without reliance on optical viewports or capacitive sensing. Atomically resolved topographic imaging and tunneling spectroscopy were also obtained. Our proposed navigation strategy is fully compatible with standard device fabrication procedures and requires no hardware modification to existing STM setups. As such, it offers a practical alternative for locating miniaturized devices in STM, shedding light on studying emerging quantum phenomena in 2D systems.