Interference-governed electromagnetic-thermal coupling and heat transport in pulse EUV-irradiated multilayer nanofilms
Hongyu He, Li Ma, Zhiyi Xie, Yufan Liu, Chao Wu, Qiye Zheng, Yi Tao, Yunfei Chen, Chenhan Liu

TL;DR
This paper presents an analytical model linking electromagnetic interference effects with heat transport in multilayer nanofilms under EUV irradiation, revealing trade-offs affecting mirror performance and lifetime.
Contribution
It introduces a novel electromagnetic-thermal coupling model that accounts for interference-controlled energy deposition and transient heat conduction in multilayer nanostructures.
Findings
Increasing multilayer period enhances reflectivity but raises temperature.
Interference-driven volumetric absorption causes axial temperature gradients.
The model predicts scaling laws for thermal confinement and mirror lifetime.
Abstract
Mo-Si multilayer mirrors are central to extreme ultraviolet lithography, where nanoscale optical interference and heat accumulation together constrain reflectivity and operational stability. Here we develop an analytical electromagnetic-thermal coupling model that directly links transfer-matrix-based interference-controlled energy deposition with transient heat conduction in EUV-irradiated multilayers. The model reveals a fundamental trade-off whereby increasing the multilayer period number enhances reflectivity but simultaneously elevates temperature by impeding heat dissipation. Interference-driven volumetric absorption further gives rise to pronounced axial temperature gradients and a post-pulse downward migration of the heat-flux maximum, a delayed-heating effect inaccessible to conventional surface-flux-based models. Systematic analysis establishes scaling laws connecting…
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Taxonomy
TopicsOptical Coatings and Gratings · Silicon and Solar Cell Technologies · Advanced X-ray Imaging Techniques
