Anisotropic Kinetics of Ion-Irradiation-Induced Phase Transition in Gallium Oxide
Taiqiao Liu, Tongtong Wang, Zeyuan Li, E Zhou, Junlei Zhao, Jiaren Feng, Xiaoyu Fei, Yuzheng Guo, Flyura Djurabekova, Sheng Liu, Zhaofu Zhang

TL;DR
This study reveals that surface crystallographic orientation in gallium oxide deterministically influences radiation tolerance by controlling anisotropic phase transition kinetics, enabling design of radiation-resistant materials.
Contribution
It demonstrates that surface orientation governs radiation tolerance via anisotropic phase transition kinetics in gallium oxide, introducing a new design principle for radiation-resistant semiconductors.
Findings
Channeling surfaces resist damage and promote subsurface phase nucleation.
Different surface orientations follow distinct recovery pathways after irradiation.
Surface orientation critically affects the critical dose and stability of the gamma phase.
Abstract
Radiation-tolerant semiconductors have traditionally been engineered by the principle of suppressing defect accumulation and amorphization, based on the assumption that radiation damage is inherently stochastic. Here we show that, in monoclinic -\ce{Ga2O3}, a promising ultrawide-bandgap semiconductor, surface crystallographic orientation deterministically governs radiation tolerance through highly anisotropic kinetics of the -to- phase transition. Using machine-learning molecular dynamics coupled with a local configurational-entropy descriptor, we quantitatively map anisotropic -to- transition kinetics, showing that the critical dose, transition-layer depth, and kinetic stability of the -phase are fundamentally governed by surface orientation. Under ion irradiation, non-channeling surfaces such as (100), (001), and (-201) undergo severe…
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Taxonomy
TopicsGa2O3 and related materials · Machine Learning in Materials Science · Ion-surface interactions and analysis
