Topological surface phonons modulate thermal transport in semiconductor thin films
Zhe Su, Shuoran Song, Qi Wang, Jian-Hua Jiang

TL;DR
This study reveals that topological surface phonons significantly influence thermal transport in semiconductor thin films, contributing over 30% to thermal conductivity at nanoscale dimensions and can be modulated by temperature and strain.
Contribution
It provides the first quantitative analysis of how topological surface phonons affect nanoscale thermal transport in semiconductors.
Findings
Topological surface phonons contribute over 30% to thermal conductivity in thin films.
Their contribution can reach up to 82 W/m-K at 300 K.
Temperature and biaxial strain effectively modulate this contribution.
Abstract
While phonon topology in crystalline solids has been extensively studied, its influence on thermal transport-especially in nanostructures-remains elusive. Here, by combining first-principles-based machine learning potentials with the phonon Boltzmann transport equation and molecular dynamics simulations, we systematically investigate the role of topological surface phonons in the in-plane thermal transport of semiconductor thin films (Si, 4H -SiC, and c-BN). These topological surface phonons, originating from nontrivial acoustic phonon nodal lines, not only serve as key scattering channels for dominant acoustic phonons but also contribute substantially to the overall thermal conductivity. Remarkably, for these thin semiconductor films below 10 nm this contribution can be as large as over 30% of the in-plane thermal conductivity at 300 K, and the largest absolute contribution can reach…
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Taxonomy
TopicsThermal properties of materials · Advanced Thermoelectric Materials and Devices · Thermography and Photoacoustic Techniques
