Eliminating the irregular surface layer of anodically-grown Ni-Ti-O nanopore arrays in a two-stage anodization

TL;DR

This study introduces a two-stage anodization process for Ni-Ti alloy that effectively removes irregular surface layers and produces uniform nanopore arrays with increased surface area, beneficial for various nanostructure applications.

Contribution

The paper presents a novel two-stage anodization method combining static and stirred electrolyte conditions to optimize nanopore regularity and thickness in Ni-Ti alloys.

Findings

Two-stage anodization yields highly regular nanopore arrays.

Stirred electrolyte reduces irregular surface layers.

Optimized process produces nanopores up to 40 nm in diameter.

Abstract

Nanopores (NPs) grown by anodizing can be partially hidden beneath a relatively compact surface oxide layer, which limits the volumetric surface area of these nanostructures. In this work, nitinol (NiTi) alloy was anodized in an electrolyte containing ethylene glycol, water, and sodium chloride in static and stirred electrolyte stages with the aim of removing the irregular surface array while achieving a thick NP layer. Electron micrographs showed that anodization in the static electrolyte provides a controlled thickness of NP layers covered by an irregular surface layer. In contrast, anodizing in the stirred electrolyte reduced the thickness and the degree of irregularity, which were controlled by the different kinetics of dissolution at the tops, perimeters and bottoms of NPs. To benefit simultaneously from the thickness and regularity of the oxide layers, two-stage anodizing under static and then stirred electrolyte conditions was found to be effective. Following a 30 min anodization in the static electrolyte, anodizing for 30 min under the stirred conditions provided the highest regularity in the oxide array, resulting in NPs of almost 40 nm and 11 {\mu}m in diameter and layer thickness, respectively. Two-stage anodizing under static then stirred electrolyte conditions is proposed in order to promote NP structures for applications demanding higher surface areas.