Confinement-Induced Nonlocality and Optical Nonlinearity of Transdimensional Titanium Nitride in the Epsilon-Near-Zero Region
Fan-Ting Tseng, I-Hung Ho, Ting-Jui Kuo, Shangjr Gwo, Igor V. Bondarev, Hyeyoung Ahn

TL;DR
This paper demonstrates that ultrathin trans-dimensional titanium nitride films exhibit significantly enhanced optical nonlinearity near the epsilon-near-zero region, driven by electron confinement effects, with potential applications in ultrathin photonic devices.
Contribution
It introduces a nonlinear nonlocal electromagnetic response model for trans-dimensional TiN films, revealing their strong nonlinear enhancement in the ENZ region compared to conventional films.
Findings
Nearly two orders of magnitude stronger nonlinear absorption in TD TiN films near ENZ
Enhanced nonlinearity explained by a nonlinear nonlocal electromagnetic response model
Comparison with TiAlN highlights importance of low-loss ENZ response
Abstract
Ultrathin plasmonic films that approach the trans-dimensional (TD) thickness limit provide a promising route for light_matter interaction control and manipulation, yet their nonlinear optical response near the epsilon_near_zero (ENZ) condition remains poorly understood. Here, we report the strongly enhanced optical nonlinearity for their typical representative high quality TiN epitaxial films with thicknesses down to a few nanometers. Systematic Z_scan measurements reveal a pronounced increase in nonlinear absorption with decreasing thickness. Especially in the ENZ spectral region, the TD TiN films exhibit nearly two orders of magnitude stronger nonlinear absorption over a broad range of incidence angles as compared to conventional thin films. The enhanced nonlinear absorption observed is well described by a nonlinear nonlocal electromagnetic response model that accounts for electron…
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Taxonomy
TopicsPlasmonic and Surface Plasmon Research · Metamaterials and Metasurfaces Applications · Nonlinear Optical Materials Studies
