Gate-Tunable Giant Negative Magnetoresistance in Tellurene Driven by Quantum Geometry
Marcello B. Silva Neto, Chang Niu, Marcus V. O. Moutinho, Pierpaolo Fontana, Claudio Iacovelli, Victor Velasco, Caio Lewenkopf, Peide D. Ye

TL;DR
This study reports a giant negative magnetoresistance in tellurene driven by quantum geometric effects, with potential implications for controlling electronic transport in topological materials.
Contribution
It uncovers a record-breaking negative magnetoresistance in tellurene and proposes two novel quantum geometric mechanisms behind this phenomenon.
Findings
Negative magnetoresistance reaches -90% at zero magnetic field.
The effect is suppressed when shifting away from the Weyl node.
Magnetoelectric dependence confirms quantum geometric origin.
Abstract
Negative magnetoresistance in conventional two-dimensional electron gases is a well-known phenomenon, but its origin in complex and topological materials, especially those endowed with quantum geometry, remains largely elusive. Here, we report the discovery of a giant negative magnetoresistance, reaching a remarkable of the resistance at zero magnetic field, , in -type tellurene films. This record-breaking effect persists over a wide magnetic field range (measured up to T) at cryogenic temperatures and is suppressed when the chemical potential shifts away from the Weyl node in the conduction band, strongly suggesting a quantum geometric origin. We propose two novel mechanisms for this phenomenon: a quantum geometric enhancement of diffusion and a magnetoelectric spin interaction that locks the spin of a Weyl fermion, in cyclotron motion under crossed electric…
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Taxonomy
TopicsTopological Materials and Phenomena · 2D Materials and Applications · Chemical and Physical Properties of Materials
