Electron Emission Yield Datasets Under Electron Impact From Surfaces Characterized In Situ by XPS or AES
M.Belhaj, S. dadouch

TL;DR
This paper details the procedures for measuring and calibrating electron emission yields from various materials, using surface analysis techniques like XPS and AES, with initial data on copper and gold.
Contribution
It introduces a comprehensive methodology for producing electron emission yield datasets linked with surface composition analysis.
Findings
Emission yield datasets for copper and gold are provided.
Calibration procedures ensure data accuracy.
Surface composition influences emission yields.
Abstract
We present the measurement, characterization, and calibration procedures used to produce a series of datasets for various conductive and semiconductive materials. The data, provided, include emission yields as a function of incident electron energy together with surface composition obtained from X-Ray Photoelectron Spectroscopy or Auger Electron Spectroscopy analyses. Initial datasets cover copper and gold, with additional materials to be released on arXiv.
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsElectron and X-Ray Spectroscopy Techniques · X-ray Spectroscopy and Fluorescence Analysis · Advanced Electron Microscopy Techniques and Applications
