In-Situ Encryption of Single-Transistor Nonvolatile Memories without Density Loss
Sanwar Ahmed Ovy, Jiahui Duan, Md Ashraful Islam Romel, Franz Muller, Thomas Kampfe, Kai Ni, Sumitha George

TL;DR
This paper introduces a novel in-situ encryption method for single-transistor nonvolatile memories using FeFET devices, achieving high density, faster encryption, and significant performance improvements over traditional AES encryption.
Contribution
It presents the first single-FeFET XOR-based encryption scheme that eliminates the need for two memory devices per cell, enabling dense, fast, and efficient encrypted memory arrays.
Findings
2x higher encryption/decryption throughput than prior FeFET work
45.2x/14.12x improvement over AES in throughput
50% and 95% latency reductions in neural-network benchmarks
Abstract
Non-volatile memories (NVMs) offer negligible leakage power consumption, high integration density, and data retention, but their non-volatility also raises the risk of data exposure. Conventional encryption techniques such as the Advanced Encryption Standard (AES) incur large area overheads and performance penalties, motivating lightweight XOR-based in-situ encryption schemes with low area and power requirements. This work proposes an ultra-dense single-transistor encrypted cell using ferroelectric FET (FeFET) devices, which, to our knowledge, is the first to eliminate the two-memory-devices-per-encrypted-cell requirement in XOR-based schemes, enabling encrypted memory arrays to maintain the same number of storage devices as unencrypted arrays. The key idea is an in-memory single-FeFET XOR scheme, where the ciphertext is encoded in the device threshold voltage and leverages the…
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Taxonomy
TopicsFerroelectric and Negative Capacitance Devices · Magnetic properties of thin films · Advancements in Semiconductor Devices and Circuit Design
