High-yield engineering and identification of oxygen-related modified divacancies in 4H-SiC
Qi-Cheng Hu, Ji-Yang Zhou, Shuo Ren, Zhen-Xuan He, Zhi-He Hao, Rui-Jian Liang, Wu-Xi Lin, Xiangru Han, Adam Gali, Jin-Shi Xu, Chuan-Feng Li, and Guang-Can Guo

TL;DR
This study presents a high-yield method for engineering and identifying oxygen-related divacancies in 4H-SiC, revealing their atomic structure and superior quantum properties for scalable quantum technology applications.
Contribution
The paper introduces a controllable oxygen-ion implantation technique to efficiently produce and identify oxygen-related divacancies in 4H-SiC, clarifying their structure and enhancing their quantum properties.
Findings
Over 90% of defects are single oxygen-vacancy centers with superior optical and spin coherence.
Four types of oxygen-related divacancies are experimentally resolved and identified.
High-density ensembles with distinct temperature-dependent spin properties are achieved.
Abstract
Modified divacancies in the 4H polytype of silicon carbide (SiC) exhibit enhanced charge stability and spin addressability at room temperature, making them attractive for quantum applications. However, their low formation yield and lack of direct structural identification have hindered progress. Here, we demonstrate a controllable method for high-yield engineering and identification of oxygen-related modified divacancy color centers in 4H-SiC via oxygen-ion implantation. Based on their distinct optical and spin-resonance characteristics, we experimentally resolve four types of modified divacancies. Furthermore, by measuring isotope-resolved 17O hyperfine interactions, we identify them as the four crystallographic configurations of oxygen-vacancy (OV) complexes. Remarkably, single OV centers account for over 90% of the total defect population and exhibit superior optical properties and…
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