Al$_{1-x}$Hf$_{x}$N Thin Films with Enhanced Piezoelectric Responses for GHz Surface Acoustic Wave Devices
Laura I. Wagner, Verena Streibel, Esperanza Luna, Katarina S. Flashar, Walid Anders, Nicole Volkmer, Doreen Steffen, Frans Munnik, Tsedenia A. Zewdie, Saswati Santra, Ian D. Sharp, Mingyun Yuan

TL;DR
This study explores aluminum hafnium nitride (Al$_{1-x}$Hf$_{x}$N) thin films as a scalable, CMOS-compatible material with significantly improved piezoelectric responses for GHz surface acoustic wave devices, demonstrating enhanced device performance.
Contribution
It introduces Al$_{1-x}$Hf$_{x}$N as a novel, scalable alternative to Scandium-doped AlN with improved piezoelectric properties for high-frequency applications.
Findings
Nearly two-fold increase in piezoelectric coefficient $d_{33}$ compared to AlN.
Successful fabrication of GHz SAW resonators with enhanced performance.
Efficient excitation of bulk acoustic waves with low propagation losses.
Abstract
Ternary compounds obtained by alloying wurtzite AlN with transition metals have emerged as promising materials with significantly enhanced piezoelectric characteristics relative to binary AlN. The increased electromechanical coupling in these compounds boosts the performance of high-frequency acoustic devices. So far, progress has largely focused on AlScN, which is costly and poorly compatible with complementary metal-oxide-semiconductor (CMOS) technologies. Here, we investigate aluminum hafnium nitride (AlHfN) as a scalable and potentially CMOS-compatible alternative to AlScN. Using reactive co-sputtering on both Si and sapphire substrates, we demonstrate wurtzite AlHfN thin films () with strong -axis texture and nearly isotropic lattice expansion upon Hf incorporation. X-ray absorption spectroscopy indicates cross-gap…
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Taxonomy
TopicsAcoustic Wave Resonator Technologies · Mechanical and Optical Resonators · Boron and Carbon Nanomaterials Research
