Ultrafast {\mu}eV-Precision Bandgap Engineering in Low-Dimensional Topological Insulators
Peng Tan, Yuantao Chen, Yuqi Zhang, Hanyan Cheng, Guoyu Xian, Ming Cheng, Minghong Sun, Jiaxin Yin, Feifan Wang, Yaxian Wang, Yanjun Liu, Mingyuan Huang, Zhiwei Wang, Yugui Yao, Sheng Meng, Li Huang, Yanan Dai

TL;DR
This paper demonstrates ultrafast, micro-electron-volt precision control of the electronic bandgap in a topological insulator using cryogenic transient reflectance spectroscopy, enabling dynamic and mode-selective band structure tuning.
Contribution
It introduces a novel method for real-time, high-precision bandgap engineering in topological insulators through combined experimental and theoretical approaches.
Findings
Achieved micro-eV precision in dynamic bandgap control.
Identified symmetry-resolved phonons modulating electronic structure.
Developed a dual-pump coherent control strategy for mode-selective tuning.
Abstract
Precise and ultrafast control of electronic band structures is a central challenge for advancing quantum functional materials and devices. Conventional approaches--such as chemical doping, lattice strain, or external gating--offer robust stability but remain confined to the quasi-static regime, far from the intrinsic femto- to picosecond dynamics that govern many-body interactions. Here, using cryogenic transient reflectance spectroscopy, we realize dynamic bandgap engineering in the anisotropic topological insulator -BiBr with unprecedented micro-electron-volt (eV) precision. The exceptional sensitivity arises from the cooperative action of long-lived topological carriers, stabilized by restricted bulk-to-edge scattering phase space, together with symmetry-resolved coherent phonons that modulate inter-chain hopping. These channels jointly modify Coulomb screening…
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Taxonomy
TopicsTopological Materials and Phenomena · 2D Materials and Applications · Graphene research and applications
