Cryogenic UV detection using stress-engineered zero-bias ZnO-thin film based Piezo-Photonic detector
P. Sau, N. Hancock, I. Tzoka, V. Khichar, A. Barajas, G. Gansle, N. Hozhabri, V.A. Chirayath, J. Asaadi

TL;DR
This paper presents a cryogenic UV detector based on stress-engineered ZnO thin films that operates at zero bias, showing enhanced sensitivity through in-device stress manipulation, suitable for extreme environment applications.
Contribution
The study introduces a stress-engineered zero-bias ZnO-based UV detector with improved sensitivity, demonstrating the role of residual stress in enhancing photoresponse at cryogenic temperatures.
Findings
Sample II with Si3N4 pillars shows 40% higher residual stress.
Higher residual stress correlates with increased UV-induced voltage signals.
Device operates effectively at cryogenic temperatures with zero bias.
Abstract
We demonstrate a zero-bias ultraviolet (UV) detector using zinc oxide (ZnO) thin films as the active semiconductor layer, specifically for application in cryogenic conditions. The zero-bias device utilizes the piezoelectric potential developed through interfacial stress in the active semiconductor layer for charge transport. We explored two vertically stacked metal-semiconductor-metal (MSM) configurations: Sample I, a device comprised of chromium (Cr)/ZnO/Cr layers, and Sample II, a ZnO-silicon nitride (Si3N4) device comprised of Cr/Si3N4/ZnO/Cr layers. The Si3N4 layer in Sample II was introduced in the form of pillars, with the aim of increasing the residual stress in the active region. These fabricated devices were tested at both room and cryogenic temperatures to characterize their UV-detection performance in a custom test stand using a 365 nm UV LED source. We observe a higher…
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Taxonomy
TopicsGa2O3 and related materials · GaN-based semiconductor devices and materials · Thin-Film Transistor Technologies
