Controlled growth of rare-earth-doped TiO$_{2}$ thin films on III-V semiconductors for hybrid quantum photonic interfaces
Henry C. Hammer, Caleb Whittier, Nathan A. Helvy, Christopher Rouleau, Nabil D. Bassim, Ravitej Uppu

TL;DR
This paper demonstrates a low-temperature epitaxial growth method for Er$^{3+}$-doped TiO$_{2}$ thin films on III-V semiconductors, enabling integration of quantum memories with photon sources for scalable quantum photonics.
Contribution
It introduces a controlled growth process for epitaxial Er$^{3+}$-doped TiO$_{2}$ on GaAs and GaSb, overcoming lattice mismatch and growth challenges for hybrid quantum photonic interfaces.
Findings
Successful low-temperature epitaxial growth of anatase TiO$_{2}$ with smooth surfaces.
Verification of Er$^{3+}$ optical activation via spectroscopy.
Preservation of quantum dot functionality on III-V substrates.
Abstract
Quantum photonic networks require two distinct functionalities: bright single-photon sources and long-lived quantum memories. III-V semiconductor quantum dots excel as deterministic and coherent photon emitters, while rare-earth ions such as erbium (Er) in crystalline oxides offer exceptional spin and optical coherence at telecom wavelengths. Combining these systems and their functionalities via direct epitaxy is challenging due to lattice mismatch and incompatible growth conditions. Here we demonstrate low-temperature pulsed laser deposition of Er-doped TiO thin films directly on GaAs and GaSb substrates. Controlled surface preparation with an arsenic cap and an oxygen-deficient buffer layer enables the growth of epitaxial anatase TiO (001) at 390C with sub-300 pm surface roughness, while avoiding interface degradation. In contrast, high-temperature…
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Taxonomy
TopicsNear-Field Optical Microscopy · Semiconductor Quantum Structures and Devices · Silicon Nanostructures and Photoluminescence
