An Atomistically Informed Device Engineering (AIDE) Method Realized: A case study in GaAs
Leopoldo Diaz, Harold P. Hjalmarson, Jesse J. Lutz, and Peter A. Schultz

TL;DR
The paper introduces the AIDE method that combines first-principles defect data with experimental parameters to simulate defect chemistry in semiconductors, demonstrated through a GaAs case study.
Contribution
It presents a novel, generalizable AIDE approach that integrates atomistic defect properties into device modeling, enabling dynamic simulation of defect chemistry in semiconductors.
Findings
Fermi level dynamics and equilibrium in GaAs were successfully modeled.
Identification of arsenic vacancy charge states consistent with experimental data.
Demonstration of Coulomb attraction leading to defect formation in GaAs.
Abstract
Radiation-induced defects can have a significant impact on the longevity and performance of semiconductor devices. We present an Atomistically Informed Device Engineering (AIDE) method that integrates first-principles defect properties and experimentally measured parameters into a device model to dynamically simulate the defect chemistry in semiconductors. For a silicon-doped gallium arsenide (GaAs) material, we showcase three capabilities: (i) Fermi level movement including its component electron and hole Fermi levels, (ii) dynamical charge equilibration with the arsenic vacancy serving as an example, and a (iii) diffusion-driven reaction between Coulomb attracted gallium interstitial () and arsenic vacancy (). Governed by charge carrier reactions, the electron and hole Fermi levels remained dissimilar until equilibrium was achieved at eV. The…
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Taxonomy
Topicssolar cell performance optimization · Silicon and Solar Cell Technologies · Semiconductor Quantum Structures and Devices
