Bandgap Engineering On Demand in GaAsN Nanowires by Post-Growth HydrogennImplantation
Nadine Denis, Akant Sharma, Elena Blundo, Francesca Santangeli, Paolo De Vincenzi, Riccardo Pallucchi, Mitsuki Yukimune, Alexander Vogel, Ilaria Zardo, Antonio Polimeni, Fumitaro Ishikawa, Marta DeLuca

TL;DR
This study demonstrates reversible, tunable, and non-destructive post-growth bandgap engineering in GaAsN nanowires using hydrogen implantation and annealing, enabling precise control of optical properties for photonic devices.
Contribution
It introduces a novel method of post-growth bandgap tuning in GaAsN nanowires via hydrogen implantation, which was previously unattainable in epilayers.
Findings
Bandgap increased by up to 460 meV through hydrogen implantation.
Photoluminescence efficiency increased by an order of magnitude.
Bandgap tuning is reversible and can be locally controlled by laser annealing.
Abstract
Bandgap engineering in semiconductors is required for the development of photonic and optoelectronic devices with optimized absorption and emission energies. This is usually achieved by changing the chemical or structural composition during growth or by dynamically applying strain. Here, the bandgap in GaAsN nanowires grown on Si is increased post-growth by up to 460 meV in a reversible, tunable, and non-destructive manner through H implantation. Such a bandgap tunability is unattained in epilayers and enabled by relaxed strain requirements in nanowire heterostructures, which enables N concentrations of up to 4.2% in core-shell GaAs/GaAsN/GaAs nanowires resulting in a GaAsN bandgap as low as 0.97 eV. Using micro-photoluminescence measurements on individual nanowires, it is shown that the high bandgap energy of GaAs at 1.42 eV is restored by hydrogenation through formation of N-H…
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Taxonomy
TopicsNanowire Synthesis and Applications · Semiconductor Quantum Structures and Devices · GaN-based semiconductor devices and materials
