Experimental investigation of plasma-electrode interactions on the ZaP-HD sheared-flow-stabilized Z-pinch device
Amierul Aqil Khairi, Uri Shumlak

TL;DR
This study investigates plasma-electrode interactions in the ZaP-HD Z-pinch device, revealing erosion mechanisms, electrode recycling, and surface morphology changes, which inform electrode management in high-power plasma devices.
Contribution
It provides the first detailed in-situ and ex-situ analysis of plasma-induced electrode erosion and recycling in a sheared-flow-stabilized Z-pinch device.
Findings
Sublimated carbon ionizes within the sheath, sputtered carbon beyond.
Erosion rates are comparable to arc discharge devices.
Surface morphology shows smoothing and crack formation, no clear sputtering pits.
Abstract
The ZaP-HD sheared-flow-stabilized (SFS) Z-pinch device is a testbed for experimental investigation of plasma-electrode interactions. The graphite electrode is exposed to a high temperature, high density Z-pinch plasma while supplying large pinch currents. In-situ measurements of the gross carbon erosion flux obtained with S/XB spectroscopy exceed the expected flux from physical sputtering, but have reasonable agreement with the expected sublimation flux. Comparison of the ionization mean free paths of neutrals produced through both erosion processes shows that sublimated carbon is ionized within the sheath while sputtered carbon is ionized beyond the sheath. This suggests a process of electrode recycling and self-healing through redeposition. The sputtered carbon is primarily responsible for net erosion. Ex-situ analysis of electrode material is enabled by the design of a removable…
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Taxonomy
TopicsVacuum and Plasma Arcs · Electromagnetic Launch and Propulsion Technology · Pulsed Power Technology Applications
