GaN-based Resonant Cavity LEDs Fabricated by Photo-Electrochemical Etching and Micro-Transfer Printing
Huanqing Chen, Zhi Li, Menglai Lei, Muhammet Genc, Linghai Meng, Brendan Roycroft, Weihhua Chen, Xiaodong Hu, Brian Corbett

TL;DR
This paper presents a scalable method for fabricating GaN-based resonant cavity LEDs with narrow spectral linewidth and small divergence, suitable for micro-displays and communication applications.
Contribution
The authors introduce a novel fabrication process combining photo-electrochemical etching and micro-transfer printing to produce high-quality GaN RCLEDs with improved optical properties.
Findings
Narrowed electroluminescence linewidth from 32 nm to ~5 nm.
Reduced wavelength shift from 9.3 nm to less than 1 nm with increased current.
Achieved a divergence angle as small as 52 degrees.
Abstract
Resonant cavity LEDs (RCLEDs) exhibit excellent temporal and spatial coherence with narrow spectral linewidth and small divergence angle, which is of great importance for micro-displays. In this paper, we demonstrate a novel method to create GaN-based RCLEDs by using photo-electrochemical etching and micro-transfer printing (MTP) technology. Through systematic optimizing of the etching conditions, highly selective etching of an InGaN multiple quantum well sacrificial layer is achieved with parasitic etching of adjacent layers being completely suppressed. The roughness of the underside of the exfoliated GaN film is only 3.3 nm. Raman spectroscopy shows that the residual stress in the released material is reduced from 0.74 GPa for the as-grown sample to -0.15 GPa. Using the MTP method, GaN coupons with a deposited upper dielectric mirror were transferred onto target substrates covered…
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