Theory of tunnel magnetoresistance in magnetic tunnel junctions with hexagonal boron nitride barriers: mechanism and application to ferromagnetic alloy electrodes
Ivan Kurniawan, Keisuke Masuda, Yoshio Miura

TL;DR
This paper investigates the spin-dependent tunneling mechanism in h-BN based magnetic tunnel junctions, revealing how Ni doping and interface engineering can significantly enhance tunnel magnetoresistance for spintronic applications.
Contribution
It introduces a surface-state-assisted tunneling mechanism in h-BN MTJs and demonstrates how Ni doping tunes the Fermi level to improve TMR ratios, offering new insights for device engineering.
Findings
High TMR arises from resonant tunneling of down-spin surface states.
Ni doping reduces overlap between spin channels, boosting TMR.
The mechanism is applicable to other 2D insulator-based MTJs.
Abstract
Hexagonal boron nitride (-BN), with its strong in-plane bonding and good lattice match to hcp and fcc metals, offers a promising alternative barrier material for magnetic tunnel junctions (MTJs). Here, we investigate spin-dependent transport in hcp-CoNi-BNhcp-CoNi(0001) MTJs with physisorption-type interfaces using first-principles calculations. We find that a high TMR ratio arises from the resonant tunneling of the down-spin surface states of the hcp-CoNi, having a -like symmetry around the point. Ni doping tunes the Fermi level and enhances this effect by reducing the overlap between up-spin and down-spin conductance channels in momentum space under the parallel configuration, thereby suppressing antiparallel conductance and increasing the TMR ratio. This mechanism is analogous to Brillouin zone spin filtering…
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