New Materials, New Functionalities: Molecular Beam Epitaxy of Ultra-High Conductivity Oxides
Gaurab Rimal, Tanzila Tasnim, Brian Opatosky, Ryan B. Comes, Debarghya Mallick, Simon Kim, Rob G. Moore, Seongshik Oh, and Matthew Brahlek

TL;DR
This paper reviews the use of molecular beam epitaxy (MBE) to synthesize ultra-high conductivity oxide thin films, enabling advances in electronic, spintronic, and quantum technologies through high-quality material development.
Contribution
It highlights how MBE techniques have facilitated the growth and understanding of high-conductivity oxides, advancing their potential applications in future electronic and quantum devices.
Findings
MBE enables synthesis of ultra-high conductivity oxide films.
High-quality oxide films reveal novel electronic properties.
MBE-driven materials research supports future electronic and quantum technologies.
Abstract
Understanding fundamental properties of materials is necessary for all modern electronic technologies. Toward this end, the fabrication of new ultrapure thin film materials is critical to discover and understand novel properties that can allow further development of technology. Oxide materials are a vast material class abound with diverse properties, and, therefore, harnessing such phases is critical for realizing emerging technologies. Pushing forward, however, requires understanding basic properties of insulating, semiconducting and metallic oxides, as well as the more complex phases that arise out of strong electronic correlations unique to this class of materials. In this review, we will focus on one of the unique aspects of oxides: the ultra-high conductivity metallic state, which can be a critical component for future all-oxide microelectronics such as low-loss interconnects and…
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