Multiphysics Simulation and First Prototype Development of a Microwave Plasma System for Chemical Vapour Deposition (CVD) Applications
Akash Akash, Sanjeev Kumar Pandey, Venkata Sai Teja Madana, S. Manikandan, Guhan Gunasekaran, Sundar Ravi, Sethu Narayanana, C. Nikhil, Nishant Sirse, S. Sathyan, N. Arunachalam, and M.S Ramachandra Rao

TL;DR
This paper presents the design, simulation, and preliminary experimental validation of a microwave plasma reactor for diamond film deposition, optimizing parameters for effective hydrogen plasma generation using COMSOL simulations.
Contribution
It introduces a novel microwave plasma reactor design with a unique antenna structure and provides computational analysis of plasma characteristics for CVD applications.
Findings
Reactor operates effectively at up to 6 kW power and 30 kPa pressure.
Simulations successfully optimized cavity design and plasma parameters.
Preliminary experiments confirmed plasma ignition and vacuum integrity.
Abstract
With the aid of COMSOL multiphysics simulations, a compact microwave plasma reactor operated at 2.45 GHz frequency has been designed for diamond film deposition. The reactor consists of a cylindrical cavity that resonates in the fundamental mode with a longitudinal field variation (p = 1). Investigations on microwave electric field and hydrogen plasma characteristics inside the microwave plasma cavity have been carried out, which assisted in the resonant cavity optimizations. The new reactor design includes a unique antenna structure which facilitates better thermal management and gas inlet arrangement. Parametric analysis of the effect of increase in microwave power, gas pressure and synergistic effects of power and pressure variations on the plasma characteristics such as electron density, gas temperature, and atomic hydrogen density have been performed…
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