Electronic localization on the structural inhomogeneities formed due to Bi and Te deficiency in the MBE grown films of AFM topological insulator MnBi2Te4: Evidence from spectroscopic ellipsometry and infrared studies
N. N. Kovaleva, D. Chvostova, T. N. Fursova, A. V. Muratov, S. I. Bozhko, Yu. A. Aleshchenko, A. Dejneka, D. V. Ishchenko, O. E. Tereshchenko, and K. I. Kugel

TL;DR
This study investigates how Bi and Te deficiencies in MnBi2Te4 thin films lead to electronic localization within structural inhomogeneities, using spectroscopic ellipsometry and infrared spectroscopy to analyze optical responses.
Contribution
It provides new insights into the optical properties and structural inhomogeneities of non-stoichiometric MnBi2Te4 films, revealing electron localization effects due to defects.
Findings
Optical response shifts to higher energies with increased Mn content.
Structural inhomogeneities include nearly stoichiometric MnBi2Te4 regions and quantum anti-dots.
Reduced free charge carrier contribution supports electron localization.
Abstract
The intrinsic substitutional and antisite defects cause unintentional doping and shift of the E_F position above the conduction band minimum in the AFM topological insulator (TI) MnBi2Te4. This prevents measurements of the quantum anomalous Hall effect (QAH) and investigation of the topological Dirac states. In the present study, the Mn-Bi-Te films grown by the MBE technique onto Si(111) substrates with decreasing Bi and Te contents and increasing Mn content were investigated by 0.5-6.5 eV spectroscopic ellipsometry. In addition, the 0.004-0.9 eV infrared (IR) transmittance spectra were examined. An effective medium model was used to reproduce the measured ellipsometric angles, Psi(omega) and Delta(omega), of the Mn-Bi-Te films in terms of the constructed model, including film thickness, surface roughness, and volume fractions of two (MnTe and Bi2Te3) or three constituents, the latter…
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