Beam Cross Sections Create Mixtures: Improving Feature Localization in Secondary Electron Imaging
Vaibhav Choudhary, Akshay Agarwal, and Vivek K Goyal

TL;DR
This paper models the distribution of secondary electron counts as a mixture rather than a simple convolution, enabling significant improvements in feature localization accuracy in electron imaging.
Contribution
It introduces a mixture model for beam profiles in secondary electron imaging, leading to enhanced resolution and sub-pixel localization capabilities.
Findings
Maximum likelihood estimation from time-resolved measurements reduces RMSE by 5-fold.
Mixture modeling outperforms conventional convolution-based estimators.
Empirical results show an average RMSE reduction factor of 5.4 on real datasets.
Abstract
Secondary electron (SE) imaging techniques, such as scanning electron microscopy and helium ion microscopy (HIM), use electrons emitted by a sample in response to a focused beam of charged particles incident at a grid of raster scan positions. Spot size -- the diameter of the incident beam's spatial profile -- is one of the limiting factors for resolution, along with various sources of noise in the SE signal. The effect of the beam spatial profile is commonly understood as convolutional. We show that under a simple and plausible physical abstraction for the beam, though convolution describes the mean of the SE counts, the full distribution of SE counts is a mixture. We demonstrate that this more detailed modeling can enable resolution improvements over conventional estimators through a stylized application inspired by semiconductor inspection: localizing the edge in a two-valued sample.…
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