Extreme-ultraviolet laser generation at 118 nm via adaptive random additional periodic-phase engineering in a LiF crystal
Yanling Cheng, Bin Zhang, Fei Liang, Haohai Yu, Huaijin Zhang

TL;DR
This paper demonstrates a novel method using adaptive random phase engineering in LiF crystals to generate the shortest wavelength solid-state EUV laser at 118 nm, overcoming phase mismatch and absorption issues.
Contribution
It introduces the RAPP strategy with random phase gratings in nonlinear crystals, enabling efficient EUV laser generation at unprecedented wavelengths.
Findings
EUV laser at 118 nm achieved in LiF crystals
Output power exceeds 90 μW
First demonstration of such short-wavelength solid-state EUV laser
Abstract
Extreme ultraviolet (EUV) coherent sources below 120nm are of paramount significance for promoting next-generation nano-scale lithography,precision spectroscopy, and exploring the emerging physical phenomena in quantum materials. Nonlinear optical conversion serves as the only feasible approach to obtain solid state EUV lasers, yet the intrinsic strong absorption at EUV and giant phase mismatch among light waves have hindered the realization of highly-efficient EUV light sources. Herein, we propose a random additional periodic phase (RAPP) strategy in third-order nonlinear crystals to overcome these problems, that an artificially designed random phase grating at micrometer-scales is embedded in the homogeneous bulk crystal, thus adaptively compensating the phase mismatch between fundamental-wave and third-harmonic waves. For the first time, the EUV laser at 118nm is demonstrated in the…
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