AutoEDA: Enabling EDA Flow Automation through Microservice-Based LLM Agents
Yiyi Lu, Hoi Ian Au, Junyao Zhang, Jingyu Pan, Guanglei Zhou, Yiting Wang, Jingwei Sun, Ang Li, Jianyi Zhang, Hai Li, Yiran Chen

TL;DR
AutoEDA introduces a novel framework that uses large language models and a standardized protocol to automate complex EDA workflows, significantly improving accuracy and efficiency in chip design automation.
Contribution
The paper presents AutoEDA, a comprehensive LLM-driven EDA automation framework with a new interaction protocol, local fine-tuning, and a benchmark pipeline, addressing key limitations of existing methods.
Findings
AutoEDA achieves up to 9.9x higher accuracy than naive approaches.
Reduces token usage by approximately 97% compared to in-context learning.
Demonstrates effective natural language control over RTL-to-GDSII flows.
Abstract
Electronic Design Automation (EDA) remains heavily reliant on tool command language (Tcl) scripting to drive complex RTL-to-GDSII flows. This scripting-based paradigm is labor-intensive, error-prone, and difficult to scale across large design projects. Recent advances in large language models (LLMs) suggest a new paradigm of natural language-driven automation. However, existing EDA efforts remain limited and face key challenges, including the absence of standardized interaction protocols and dependence on external APIs that introduce privacy risks. We present AutoEDA, a framework that leverages the Model Context Protocol (MCP) to enable end-to-end natural language control of RTL-to-GDSII design flows. AutoEDA introduces MCP-based servers for task decomposition, tool selection, and automated error handling, ensuring robust interaction between LLM agents and EDA tools. To enhance…
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Taxonomy
TopicsSoftware System Performance and Reliability · Model-Driven Software Engineering Techniques · Machine Learning and Data Classification
