High-quality Blazed Gratings through Synergy between E-Beam lithography and Robust Characterisation Techniques

TL;DR

This paper explores an alternative manufacturing method for high-quality blazed gratings using electron-beam lithography combined with robust characterization techniques, addressing current technological and resource limitations.

Contribution

It introduces a novel process for fabricating high-quality blazed gratings via EBL and ion beam etching, optimizing parameters for improved optical performance.

Findings

Successful development of a robust EBL-based fabrication process

Enhanced optical performance of gratings produced by the new method

Potential to increase availability of high-quality gratings in photon science

Abstract

Maintaining the highest quality and output of photon science in the VUV-, EUV-, soft- and tender-X-ray energy ranges requires high-quality blazed profile gratings. Currently, their availability is critical due to technological challenges and limited manufacturing resources. In this work we discuss the opportunity of an alternative method to manufacture blazed gratings by means of electron-beam lithography (EBL). We investigate the different parameters influencing the optical performance of blazed profile gratings produced by EBL and develop a robust process for the manufacturing of high-quality blazed gratings using polymethyl methacrylate (PMMA) as high resolution, positive tone resist and ion beam etching.