Optical and electrical probing of plasmonic metal-molecule interactions
Andrei Stefancu, Wenxuan Tang, Ming Fu, Jordan Edwards, Naomi J. Halas, Ross C. Schofield, Toby Severs Millard, Peter Nordlander, Johannes Lischner, Pilar Carro, Rupert Oulton, Emiliano Cortes

TL;DR
This study explores how different molecules affect plasmon damping on gold surfaces, revealing two distinct mechanisms—resonant electronic transitions and inelastic scattering—that influence energy transfer and electrical resistivity.
Contribution
It uncovers two regimes of chemical interface damping in plasmonic systems and links resistivity changes to plasmon energy transfer mechanisms, providing a unified understanding.
Findings
BPT causes CID via resonant LUMO excitation, dependent on plasmon energy.
ATP, adenine, and DDT induce CID through inelastic electron scattering.
Resistivity changes correlate with plasmon damping mechanisms.
Abstract
Plasmonic nanostructures enable efficient light-to-energy conversion by concentrating optical energy into nanoscale volumes. A key mechanism in this process is chemical interface damping (CID), where surface plasmons are damped by adsorbed molecules, enabling the transfer of charge to adsorbed molecules. In this study, we investigate the relationship between CID and adsorbate-induced changes in DC electrical resistivity for four molecular adsorbates-adenine, 4-aminothiophenol (ATP), biphenyl thiol (BPT), and 1-dodecanethiol (DDT)-on gold surfaces. Our results reveal two distinct CID regimes. BPT causes CID via direct electronic transitions to the lowest unoccupied molecular orbital (LUMO), which is centered at approx. 2 eV above the Fermi level and can be resonantly excited by the plasmon. This mechanism is dependent on plasmon energy. In contrast, ATP, adenine and DDT lead to plasmon…
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Taxonomy
TopicsNanofabrication and Lithography Techniques · Molecular Junctions and Nanostructures · Force Microscopy Techniques and Applications
