Voltage-Induced Oxidation for Enhanced Purity and Reproducibility of Quantum Emission in Monolayer 2D Materials
Sung-Joon Lee, Hsun-Jen Chuang, Kathleen M. McCreary, Mehmet A. Noyan, Berend T.Jonker

TL;DR
This paper introduces a voltage-induced oxidation method using AFM to improve the purity and reproducibility of quantum emitters in monolayer WSe2, enabling scalable integration into photonic devices.
Contribution
The study demonstrates a novel, nonvolatile oxidation technique that enhances single-photon purity in 2D material quantum emitters without degrading emission intensity.
Findings
g2(0) values below 0.14 in voltage-treated regions
Significant suppression of defect-related emissions
Enhanced stability and reproducibility of quantum emitters
Abstract
We report a voltage-induced oxidation technique using conductive atomic force microscopy to enhance the single-photon purity and reproducibility of quantum emitters in monolayer tung-sten diselenide (WSe2). By applying a controlled electric field across a monolayer WSe2/poly(vinylidene fluoride-co-trifluoroethylene) (P(VDF-TrFE)) on a silicon substrate, localized oxidation is induced around nanoindented emitter sites in the WSe2. This treatment selectively suppresses defect-bound exciton emissions while preserving emission from pristine regions within the indentations. Photoluminescence and second-order correlation measurements at 18 K demonstrate a substantial increase in single-photon purity when comparing emitters from untreated and voltage-treated regions. Emitters from untreated regions showed average values of g2(0) near or above the 0.5 threshold. In contrast, emitters from…
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