Absence of reflectivity of the phonon-polariton at the SiC surface from the metal mask edge

TL;DR

This study demonstrates that the edge of a metal mask on silicon carbide negligibly reflects surface phonon polariton waves, contrasting with other materials, enabling simplified wavefield calculations for polariton-based devices.

Contribution

The paper reveals that metal mask edges on SiC do not reflect SPhP waves, unlike in 2D materials, simplifying modeling and advancing surface polariton device design.

Findings

Metal mask edges do not reflect SPhP waves on SiC.

Reflection behavior differs from 2D material polaritons.

Simplifies wavefield calculations using Green functions.

Abstract

Surface phonon polariton (SPhP) waves are excited at the silicon carbide ($SiC$) surface under irradiation of light close to the lattice resonance frequency. Metal mask at the surface blocks irradiation of certain areas and thus allows tuning standing or propagating wave pattern and, thus, open opportunities for surface polariton optic devices. In this study we show by means of scanning near-field microscopy that the edge of such a mask reflects SPhP waves negligibly. This condition differs dramatically from numerous recent observations of polariton reflections in 2D materials and makes the metallized $SiC$ platform advantageous in a sense of capability to calculate wavefield using a simple Green function-based approach.