Stochastic dynamics simulation of the focused electron beam induced deposition process

TL;DR

This paper introduces a stochastic dynamics simulation approach for modeling the focused electron beam-induced deposition process, providing atomistic insights into deposit composition and morphology, validated against experiments.

Contribution

A novel multiscale stochastic dynamics model for FEBID, integrating molecular dynamics parameters, enabling detailed simulation of nanostructure growth.

Findings

Simulations reveal detailed elemental composition during growth.

Model accurately predicts deposit morphology.

Validated against experimental data.

Abstract

This work reports on the development of a new approach to the multiscale computational modelling of the focused electron beam-induced deposition (FEBID), realised using the advanced software packages: MBN Explorer and MBN Studio. Our approach is based on stochastic dynamics (SD), which describes the probabilistic evolution of complex systems. The parameters for the new SD-based FEBID model were determined using molecular dynamics (MD) simulations. A new methodology was developed for this purpose and is described in detail. This methodology can be applied to many other case studies of the dynamics of complex systems. Our work focuses on the FEBID process involving W(CO)$_6$ precursor molecules deposited on a hydroxylated SiO$_2$-H substrate. Simulations and a detailed analysis of a growing W-rich nanostructure were performed. This new approach was shown to provide essential atomistic insights into the complex FEBID process, including the elemental composition and morphology of the deposit at each stage of growth. The derived results were then compared with experimental observations and validated. The multiscale methods developed in this study can be further upgraded and applied to important technological developments, such as 3D nanoprinting.