Atomic layer deposition on particulate materials from 1988 through 2023: A quantitative review of technologies, materials and applications

TL;DR

This comprehensive review analyzes decades of research on atomic layer deposition (ALD) on particulate materials, highlighting technological developments, applications, and future prospects based on a quantitative analysis of 799 articles.

Contribution

It provides a detailed, data-driven overview of ALD on particles, including reactor types, materials, and processing conditions, with insights into applications and trends over time.

Findings

Reactor types and processing conditions vary by application

ALD on particles is extensively used in catalysis and energy storage

Historical trends show increasing research interest and technological maturity

Abstract

Atomic layer deposition (ALD) is widely studied for numerous applications and is commercially employed in the semiconductor industry, where planar substrates are the norm. However, the inherent ALD feature of coating virtually any surface geometry with atomistic thickness control is equally attractive for coating particulate materials (supports). In this review, we provide a comprehensive overview of the developments in this decades-old field of ALD on particulate materials, drawing on a bottom-up and quantitative analysis of 799 articles from this field. The obtained dataset is the basis for abstractions regarding reactor types (specifically for particles), coating materials, reactants, supports and processing conditions. Furthermore, the dataset enables direct access to specific processing conditions (for a given material, surface functionality, application etc.) and increases accessibility of the respective literature. We also review fundamental concepts of ALD on particles, and discuss the most common applications, i.e., catalysis (thermo-, electro-, photo-), batteries, luminescent phosphors and healthcare. Finally, we identify historical trends, and provide an outlook on prospective developments.