The influence of nitrogen doping and annealing on the silicon vacancy in 4H-SiC
Samuel G. Carter, Infiter Tathfif, Charity Burgess, Brenda VanMil, Suryakanti Debata, and Pratibha Dev

TL;DR
This study investigates how nitrogen doping and annealing affect the optical and magnetic properties of silicon vacancies in 4H-SiC, revealing enhancements in photoluminescence and ODMR contrast relevant for quantum applications.
Contribution
It provides new insights into the effects of nitrogen doping and annealing on silicon vacancy properties in 4H-SiC, including charge state control and improved ODMR contrast.
Findings
Nitrogen doping enhances photoluminescence depending on electron irradiation dose.
Doping increases ODMR contrast from 0.5% to 1.5%.
Doping and annealing slightly reduce dephasing times but improve sensitivity.
Abstract
The silicon vacancy () in 4H-SiC at its cubic site (V2-center) has shown significant promise for quantum technologies, due to coherent spin states, the mature material system, and stable optical emission. In these SiC-based applications, doping plays a crucial role. It can be used to control the charge state of and formation of different types of defects. Despite its importance, there has been little research on the effects of doping. In this work, we perform a study of the effects of nitrogen doping and annealing on the photoluminescence (PL), optically-detected magnetic resonance (ODMR) contrast, and dephasing times of ensembles of V2 in epilayers of 4H-SiC. The results show an enhancement of PL that depends on the electron irradiation dose for a given electron concentration, supported by theoretical modeling of the charge state of in the presence of…
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