Extending the capillary wave model to include the effect of bending rigidity: X-ray reflectivity and diffuse scattering
Chen Shen, Honghu Zhang, Beate Kl\"osgen, Benjamin M. Ocko

TL;DR
This paper extends the capillary wave model to include bending rigidity effects, enabling improved analysis of thin film surface structures via X-ray scattering techniques, especially for soft, liquid interfaces.
Contribution
The authors develop an extended capillary wave model that incorporates bending rigidity, allowing for more accurate characterization of thin film surfaces using X-ray scattering data.
Findings
The extended model accurately describes X-ray scattering for films with bending rigidity.
Pseudo XRR approach enhances resolution and compatibility with existing software.
Experimental validation shows strong agreement with traditional methods.
Abstract
The surface roughness of a thin film at a liquid interface exhibits contributions of thermally excited fluctuations. This thermal roughness depends on temperature (T), surface tension () and elastic material properties, specifically the bending modulus () of the film. A non-zero suppresses the thermal roughness at small length scales compared to an interface with zero , as expressed by the power spectral density (PSD) of the thermal roughness. The description of the X-ray scattering of the standard Capillary Wave Model (CWM), that is valid for zero , is extended to include the effect of . The extended CWM (eCWM) provides a single analytical form for both the specular XRR and the diffuse scattering around the specular reflection, and recovers the expression of the CWM at its zero limit. This new theoretical approach enables the…
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