Enhancing Gate Control and Mitigating Short Channel Effects in 20-50 nm Channel Length Amorphous Oxide Thin Film Transistors

TL;DR

This paper demonstrates that single-gate amorphous oxide thin film transistors with nanospike source/drain electrodes significantly reduce short channel effects, achieving performance comparable to larger-channel devices.

Contribution

Introducing tapered nanospike electrodes in single-gate FETs to improve gate control and mitigate short channel effects without complex dual-gate structures.

Findings

20-25 nm channel FETs with nanospike electrodes match larger 70-80 nm FETs in key metrics.

Nanospike design enhances gate control near source/drain tips.

The approach is suitable for BEOL semiconductor applications.

Abstract

Field-effect transistors (FETs) with single gates are adversely affected by short channel effects such as drain-induced barrier lowering (DIBL) and increases in the magnitude of sub-threshold swing as the channel length is reduced. Dual-gate and gate-all-around geometries are often employed to improve gate control in very short channel length transistors. This can introduce significant process complexity to the device fabrication compared to single-gate transistors. It is shown in this paper that substantial reductions in short channel effects are possible in single-gate field-effect transistors with indium gallium zinc oxide semiconductor channels by modifying the design of the source and drain electrodes to possess an array of tapered tips which are designated as nanospike electrodes. 20-25 nm channel length FETs with nanospike electrodes have DIBL and other key metrics that are comparable to those in much larger (70-80 nm) channel length FETs with a conventional source/drain electrode design. These improvements stem from better gate control near the source and drain electrode tips due to the shape of these electrodes. These bottom gate FETs had a gate insulator consisting of 9 nm thick Al2O3 and independent Ni gates. This design approach is expected to be very helpful for a variety of semiconductor technologies being considered for back-end-of-line (BEOL) applications.