On Apparent Absence of Green Gap in InGaN/GaN Quantum Disks and Wells Grown by Plasma-Assisted Molecular Beam Epitaxy
Sharif Md. Sadaf, Nirmal Anand, Emile A. Carbone, Dipon K. Ghosh, Haipeng Tang

TL;DR
This study demonstrates that efficient green and red InGaN/GaN quantum wells and disks grown by plasma-assisted molecular beam epitaxy can overcome the green gap issue, due to improved phase uniformity and reduced metallic inclusions.
Contribution
It provides experimental evidence that the green gap can be bypassed in InGaN/GaN structures grown by PAMBE by controlling growth conditions to ensure phase uniformity.
Findings
Green gap absence linked to phase uniformity in growth.
Energetic plasma flux enhances indium incorporation.
Efficient green/red emission achieved with high-quality structures.
Abstract
III-nitride based full-color blue, green and red-light emitting diodes are critically important for a broad range of important applications. To date, however, green or red color III-nitride light emitters grown by conventional growth techniques are limited in efficiency compared to blue emitters. As opposed to metal-organic chemical vapor deposition (MOCVD), while grown by plasma-assisted molecular beam epitaxy (PAMBE), the most intense emission is generally observed in the green spectral region in InGaN/GaN based light emitters. Such counterintuitive phenomenon of efficiency increase with increasing emission wavelength has been observed in both InGaN/GaN quantum-disks in nanowire and planar quantum-wells structures grown by PAMBE. Here, we experimentally show that the apparent absence of green gap in longer green wavelength is due to the difficulty of elimination of indium-rich…
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Taxonomy
TopicsGaN-based semiconductor devices and materials · Ga2O3 and related materials · Semiconductor Quantum Structures and Devices
