InGaN Nanopixel Arrays on Single Crystal GaN Substrate
Nirmal Anand, Sadat Tahmeed Azad, Christy Giji Jenson, Dipon Kumar Ghosh, Md Zunaid Baten, Pei-Cheng Ku, Grzegorz Muziol, Sharif Sadaf

TL;DR
This paper presents the fabrication and characterization of high-efficiency, nanoscale InGaN micro-LED arrays on low-dislocation GaN substrates, demonstrating promising applications in advanced display technologies.
Contribution
It introduces a scalable top-down nanostructuring method for dislocation-free InGaN micro-LEDs with enhanced light extraction and reduced QCSE, advancing display and photonic system integration.
Findings
Achieved bright blue emission with 0.46% EQE.
Demonstrated over 40% light extraction enhancement.
Monte Carlo analysis predicts near 100% yield of defect-free pixels.
Abstract
Indium gallium nitride (InGaN) quantum well (QW) micro- and nanoscale light-emitting diodes (LEDs) are promising for next-generation ultrafast optical interconnects and augmented/virtual reality displays. However, scaling to nanoscale dimensions presents significant challenges, including enhanced nonradiative surface recombination, defect and/or dislocation-related emission degradation and nanoscale pixel contact formation. In this work, we demonstrate strain-engineered nanoscale blue LED pixels fabricated via top-down nanostructuring of an all-InGaN quantum well/barrier heterostructure grown by plasma-assisted molecular beam epitaxy (PAMBE) on significantly low dislocation-density single-crystal GaN substrates. Sidewall passivation using atomic layer deposition (ALD) of Al2O3 enables excellent diode behavior, including a high rectification ratio and extremely low reverse leakage. Monte…
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Taxonomy
TopicsGaN-based semiconductor devices and materials · Anodic Oxide Films and Nanostructures · Ga2O3 and related materials
