Buried unstrained germanium channels: a lattice-matched platform for quantum technology
Davide Costa, Patrick Del Vecchio, Karina Hudson, Lucas E. A. Stehouwer, Alberto Tosato, Davide Degli Esposti, Vladimir Calvi, Luca Moreschini, Mario Lodari, Stefano Bosco, Giordano Scappucci

TL;DR
This paper introduces a lattice-matched platform using unstrained germanium channels with a strained SiGe barrier, enabling high-mobility quantum wells without metamorphic buffers, promising for quantum computing applications.
Contribution
It presents a novel heterojunction structure with unstrained Ge and lattice-matched strained SiGe, achieving low-disorder quantum wells suitable for quantum technology.
Findings
High-mobility 2D hole gas with 1.33×10^5 cm^2/Vs
Strong density-dependent effective mass and g-factor in Ge holes
Enhanced in-plane g-factor in Ge compared to strained Ge
Abstract
Strained Ge (-Ge) and strained Si (-Si) buried quantum wells have enabled advanced spin-qubit quantum processors. However, in the absence of suitable lattice-matched substrates, -Ge and -Si are deposited on defective, metamorphic SiGe substrates, which may impact device performance and scaling. Here an alternative platform is introduced, based on the heterojunction between unstrained Ge and a lattice-matched strained SiGe (-SiGe) barrier, eliminating the need for metamorphic buffers altogether. In a structure with a 52-nm-thick -SiGe barrier, a low-disorder two-dimensional hole gas is demonstrated with a high-mobility of 1.3310 cm/Vs and a low percolation density of 1.4(1)10 cm. Quantum transport shows that holes confined in the buried unstrained Ge channel have a strong density-dependent…
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