The extensive photo response on metal/n-Si clarified by the zero-gap with inter-band phonon scatterings
Kazuya Nakayam, Takanari Yasui

TL;DR
This paper explains the extensive photo response of Au/n-Si devices across UVA to NIR by analyzing zero-gap inter-band phonon scatterings, revealing new insights into directional photo-responses and extending optical range capabilities.
Contribution
It introduces a novel model based on zero-gap inter-band phonon scatterings to explain wide-range photo responses in Si devices, surpassing traditional band gap limitations.
Findings
Quantum efficiency calculations match experimental sensitivities.
Doping fills zero-gap, lowering the effective band gap.
Inter-band phonon scatterings enable extended and directional photo-responses.
Abstract
UVA to NIR with multi-directional photo responses have been found on metal (Au)/n-Si device. A reasonable explanation has not been found in various physical models of Si-devices for the phenomena. We approached a zero-gap at X (reciprocal point) in two conduction bands of Si to analysis the optical response with the inter-band phonon scatterings. The calculation of the quantum efficiency between X- and X-W successfully simulated the sensitivities in visible region (1.1 to 2.0 eV), the carrier density profile well fitted the response in NIR (0.6 to 1.0 eV). Filling up the zero-gap by doping electrons (/cm) at around X, a lower limit of 0.6 eV arose in the measurement below Si-band gap of 1.17 eV. Indirect/direct transitions of inter conduction bands: X-W, X-K and -L in the 1st Brillouin Zone/Van Hove singularity at L point, synchronizing with phonon…
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