Electrical- and magneto-transport across the thermo-elastic martensitic transformation in anti-site-disordered off-stoichiometric Co-Fe-Ti-Si Heusler alloy thin films
Mainur Rahaman, Lanuakum A Longchar, Rajeev Joshi, R. Rawat, M. Manivel Raja, S. N. Kaul, S. Srinath

TL;DR
This study explores how anti-site disorder affects electrical and magneto-transport properties across the martensitic transformation in off-stoichiometric Co-Fe-Ti-Si Heusler alloy thin films, revealing disorder-dependent phase behaviors and potential applications.
Contribution
It provides a systematic analysis of the impact of anti-site disorder on transport phenomena during the martensitic phase transition in CFTS thin films, highlighting disorder's role in phase stability and magnetoresistance.
Findings
Disorder influences the sign of the temperature coefficient of resistivity.
Quantum corrections become more prominent with increased anti-site disorder.
Distinct magnetoresistance behaviors are observed in martensite and austenite phases.
Abstract
In this work, we systematically investigate the effect of Anti-site Disorder (ASD) on electrical resistivity and transverse magnetoresistance in off-stoichiometric Co-Fe-Ti-Si (CFTS) thin films across the thermo-elastic martensitic phase transformation (MPT). The CFTS films with A2 ASD exhibit a negative temperature coefficient of resistivity (n-TCR) and an upturn below K. In sharp contrast, the partially L2-ordered films are metallic in nature, characterized by a resistivity minimum at low temperatures (K) and a positive TCR for . The change in the sign of TCR finds a straightforward explanation in terms of the competition between the quantum corrections (weak localization, electron-diffuson scattering) and the ballistic scattering mechanisms (electron-magnon and electron-phonon). We find that, stronger the atomic…
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Taxonomy
TopicsShape Memory Alloy Transformations · Heusler alloys: electronic and magnetic properties · Multiferroics and related materials
