Spatially Mapping Phonon Drag in Ultrascaled 5-nm Silicon Nanowire Field-Effect Transistor Based on a Quantum Hydrodynamic Formalism
Houssem Rezgui, Giovanni Nastasi, Manuel Marcoux, Vittorio Romano

TL;DR
This paper investigates the phonon drag effect in ultrascaled 5 nm silicon nanowire FETs using a quantum hydrodynamic model, revealing its significant role in self-heating and thermal conductivity reduction.
Contribution
It introduces a quantum hydrodynamic formalism to analyze phonon drag in ultrascaled nanowires, providing new insights into thermal effects at the nanoscale.
Findings
Phonon drag reduces thermal conductivity by nearly 50% at high bias.
Self-heating in ultrascaled transistors is driven by electron-phonon interactions.
Quantum hydrodynamic approach explains phonon contributions to thermal transport.
Abstract
The growing demand for better performance and lower thermal energy dissipation in nanoelectronic devices is the major driving force of the semiconductor industry's quest for future generations of nanotransistors. Over the past 15 years, the miniaturization of silicon-based nanoelectronics predicted by Moore's law has driven an aggressive scaling down of transistor structures, including materials, design, and geometries. In this regard, the electronic device community has expanded its focus to ultrascaled transistors targeting the 7 nm technology node and beyond. However, these emerging nanodevices also present thermal challenges that can limit carrier transport as a result of strong electron-phonon coupling. In this work, we investigate the physical origin of self-heating effects in an ultrascaled 5 nm silicon nanowire field-effect transistor. Based on a quantum hydrodynamic approach,…
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