Anisotropic Strain Relaxation-Induced Directional Ultrafast Carrier Dynamics in RuO2 Films
S. G. Jeong, I. H. Choi, S. Lee, J. Y. Oh, S. Nair, J. H. Lee, C. Kim,, A. Seo, W. S. Choi, T. Low, J. S. Lee, and B. Jalan

TL;DR
This paper demonstrates how anisotropic strain engineering in RuO2/TiO2 heterostructures induces directional ultrafast carrier dynamics, enabling polarization-sensitive optoelectronic responses in metallic systems.
Contribution
It introduces epitaxial strain engineering to achieve anisotropic ultrafast carrier dynamics in metals, a novel approach for polarization-sensitive optoelectronic applications.
Findings
Revealed strong anisotropic transient optoelectronic response along different crystallographic directions.
Identified strain-induced modifications in band nesting as the mechanism for anisotropic carrier relaxation.
Established epitaxial strain engineering as a tool for tuning metallic optoelectronic responses.
Abstract
Ultrafast light-matter interactions inspire potential functionalities in picosecond optoelectronic applications. However, achieving directional carrier dynamics in metals remains challenging due to strong carrier scattering within a multiband environment, typically expected to isotropic carrier relaxation. In this study, we demonstrate epitaxial RuO2/TiO2 (110) heterostructures grown by hybrid molecular beam epitaxy to engineer polarization-selectivity of ultrafast light-matter interactions via anisotropic strain engineering. Combining spectroscopic ellipsometry, X-ray absorption spectroscopy, and optical pump-probe spectroscopy, we revealed the strong anisotropic transient optoelectronic response of strain-engineered RuO2/TiO2 (110) heterostructures along both in-plane [001] and [1-10] crystallographic directions. Theoretical analysis identifies strain-induced modifications in band…
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Taxonomy
TopicsNonlinear Photonic Systems · Mechanical and Optical Resonators · Advanced Fiber Laser Technologies
