Anomalous Hall effect in highly c-plane oriented Mn$_{3}$Ge/Si(100) thin films grown by pulsed laser deposition
Indraneel Sinha, Purba Dutta, Nazma Firdosh, Shreyashi Sinha, Nirmal, Ganguli, Sujit Manna

TL;DR
This study reports the successful growth of highly oriented Mn3Ge thin films on silicon, revealing atomic-scale Kagome lattice structures and demonstrating significant anomalous Hall effects relevant for antiferromagnetic spintronics.
Contribution
First demonstration of c-plane oriented Mn3Ge thin films on Si(100) with atomic-scale Kagome lattice and measurable anomalous Hall effect.
Findings
Atomic-scale Kagome lattice observed on Mn3Ge surface
Anomalous Hall resistivity up to 0.41 μΩ·cm at 2 K
Room temperature anomalous Hall response suggests spintronic potential
Abstract
Antiferromagnetic MnGe with a non-collinear Kagome structures present exciting prospects for exploring Berry curvature driven anomalous Hall effects (AHE). Despite substantial progress in bulk systems, the synthesis of crystalline thin films directly on silicon with a hexagonal phase presents a particular challenge unless a buffer layer is employed. In this study, we report the synthesis of single phase c-plane oriented hexagonal MnGe(0001) films on Si(100) using pulsed laser deposition. Under suitable growth conditions, we obtain layer-by-layer films with atomically flat surfaces and interfaces. High-resolution scanning tunneling microscopy study reveals the detail surface atomic structures, where the surface Mn atoms spontaneously arrange into a Kagome lattice. Tunneling spectroscopy (dI/dV) measurement on the atomically resolved Kagome surface show a minima in local…
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Taxonomy
TopicsMagnetic Properties and Applications · Magnetic properties of thin films · Semiconductor materials and interfaces
