Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate
Yuan Ren, Boyang Nan, Rongbo Wu, Yong Zheng, Ruixue Liu, Yunpeng Song,, Min Wang, and Ya Cheng
TL;DR
This paper presents an 8-meter-long thin-film lithium niobate optical true delay line fabricated with a novel technique, achieving ultra-low transmission loss suitable for telecom applications.
Contribution
The work introduces a new fabrication method for long, low-loss TFLN delay lines, advancing integrated photonics technology.
Findings
Achieved 0.036 dB/cm loss in the telecom band
Demonstrated fabrication of 8-meter-long delay line
Utilized photolithography-assisted chemomechanical etching
Abstract
We report the fabrication of an 8-meter-long thin-film lithium niobate (TFLN) optical true delay line (OTDL) using the photolithography-assisted chemomechanical etching (PLACE) technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.
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Taxonomy
TopicsPhotonic and Optical Devices · Photorefractive and Nonlinear Optics · Advanced Photonic Communication Systems