Landau-Levich Scaling for Optimization of Quantum Dot Layer Morphology and Thickness for Enhanced Quantum-Dot Light-Emitting Diode Performance
Yiman Xu, Grant J. Dixon, Qing Xie, James F. Gilchrist, Brandi M., Cossairt, David S. Ginger, Elsa Reichmanis

TL;DR
This paper demonstrates how controlling blade-coating speed within the Landau-Levich regime can precisely optimize quantum dot layer morphology and thickness, significantly improving the efficiency and scalability of quantum-dot LEDs.
Contribution
It introduces a method to control quantum dot film thickness and morphology via blade speed in the Landau-Levich regime, enabling scalable production of high-quality QLEDs.
Findings
Achieved 1.5% EQE with commercial QDs
Achieved 7% EQE with lab-made QDs
Demonstrated uniform QD layers with low roughness
Abstract
Quantum dot (QD) light-emitting diodes (QLEDs) are promising candidates for next-generation displays because of their high efficiency, brightness, broad color gamut, and solution-processability. Large-scale solution-processing of electroluminescent QLEDs poses significant challenges, particularly concerning the precise control of the active layer's thickness and uniformity. These obstacles directly impact charge transport, leading to current leakage and reduced overall efficiency. Blade-coating is a prevalent and scalable solution processing technique known for its speed and minimal waste. Additionally, it allows for continuous "roll-to-roll" processing, making it highly adaptable in various applications. In this study, we demonstrate the precise control of blade speed in the Landau-Levich regime to create a uniform QD emission layer, using a commercial CdSe/ZnS QD as a representative…
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Taxonomy
TopicsSemiconductor Lasers and Optical Devices · Semiconductor Quantum Structures and Devices · Quantum Dots Synthesis And Properties
