Atomic layer etching of SiO$_2$ using sequential SF$_6$ gas and Ar plasma

TL;DR

This paper introduces a highly controllable atomic layer etching process for SiO2 using sequential SF6 gas and Ar plasma, achieving precise, reproducible etching with high synergy and directional control at near room temperature.

Contribution

The authors developed a novel ALE process for SiO2 that combines SF6 gas and Ar plasma to achieve high synergy and precise atomic-scale etching, advancing nanofabrication capabilities.

Findings

Stable etching rate of ~1.4 Å/cycle achieved.

Etching occurs only with sequential reactions, indicating 100% synergy.

Directional etching effect observed over multiple cycles.

Abstract

In the relentless pursuit of advancing semiconductor technologies, the demand for atomic layer processes has given rise to innovative processes, which have already played a significant role in the continued miniaturization features. Among these, atomic layer etching (ALE) is gaining increasing attention, offering precise control over material removal at the atomic level. Despite some thermal ALE achieved sub-nm etching controllability, the currently practical ALE processes that involve plasmas steps often suffer from high etch rates due to the scarcity of highly synergistic ALE half-reactions. To overcome this limitation, we developed an ALE process of silicon dioxide (SiO$_2$) on a silicon wafer using sequential pure sulfur hexafluoride (SF6$_6$ gas exposure and argon (Ar) plasma etching near room temperature, achieving a stable and consistent etching rate of approximately 1.4 {\AA}/cycle. In this process, neither of the two half-cycle reactions alone produces etching effects, and etching only occurs when the two are repeated in sequence, which means a 100% synergy. The identification of temperature and plasma power windows further substantiates the high synergy of our ALE process. Moreover, detailed morphology characterization over multiple cycles reveals a directional etching effect. This study provides a reliable, reproducible, and highly controllable ALE process for SiO$_2$ etching, which is promising for nanofabrication processes.